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Citation: Wj. Dauksher et al., Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks, MICROEL ENG, 57-8, 2001, pp. 607-612

Authors: Dauksher, WJ Resnick, DJ Clemens, SB Standfast, DL Masnyj, ZS Wasson, JR Bergmann, NM Han, SI Mangat, PJS

Citation: Wj. Dauksher et al., TaSiN thin-film pattern transfer optimization for 200 mm SCALPEL and extreme ultraviolet lithography masks, J VAC SCI B, 18(6), 2000, pp. 3232-3236