Login
|
New Account
AAAAAA
ITA
ENG
Results:
1-4
|
Results: 4
Integrated multi-scale model for ionized plasma physical vapor deposition
Authors:
Arunachalam, V Rauf, S Coronell, DG Ventzek, PLG
Citation:
V. Arunachalam et al., Integrated multi-scale model for ionized plasma physical vapor deposition, J APPL PHYS, 90(1), 2001, pp. 64-73
Molecular dynamics simulation of Cu and Ar ion sputtering of Cu (111) surfaces
Authors:
Kress, JD Hanson, DE Voter, AF Liu, CL Liu, XY Coronell, DG
Citation:
Jd. Kress et al., Molecular dynamics simulation of Cu and Ar ion sputtering of Cu (111) surfaces, J VAC SCI A, 17(5), 1999, pp. 2819-2825
Monte Carlo simulations of sputter deposition and step coverage of thin films
Authors:
Coronell, DG Egan, EW Hamilton, G Jain, A Venkatraman, R Weitzman, B
Citation:
Dg. Coronell et al., Monte Carlo simulations of sputter deposition and step coverage of thin films, THIN SOL FI, 333(1-2), 1998, pp. 77-81
Molecular dynamics-based ion-surface interaction models for ionized physical vapor deposition feature scale simulations
Authors:
Coronell, DG Hansen, DE Voter, AF Liu, CL Liu, XY Kress, JD
Citation:
Dg. Coronell et al., Molecular dynamics-based ion-surface interaction models for ionized physical vapor deposition feature scale simulations, APPL PHYS L, 73(26), 1998, pp. 3860-3862
Risultati:
1-4
|