Authors:
Proost, J
Witvrouw, A
Maex, K
D'Haen, J
Cosemans, P
Citation: J. Proost et al., Electromigration-induced drift in damascene and plasma-etched Al(Cu). I. Kinetics of Cu depletion in polycrystalline interconnects, J APPL PHYS, 87(1), 2000, pp. 86-98
Authors:
D'Haen, J
Cosemans, P
Manca, JV
Lekens, G
Martens, T
De Ceuninck, W
D'Olieslaeger, M
De Schepper, L
Maex, K
Citation: J. D'Haen et al., Dynamics of electromigration induced void/hillock growth and precipitation/dissolution of addition elements studied by in-situ scanning electron microscopy resistance measurements, MICROEL REL, 39(11), 1999, pp. 1617-1630