Authors: Scopel, WL Cuzinatto, RR Tabacniks, MH Fantini, MCA Alayo, MI Pereyra, I

Citation: Wl. Scopel et al., Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition, J NON-CRYST, 288(1-3), 2001, pp. 88-95