Authors: DANG TA FRISK TA

Citation: Ta. Dang et Ta. Frisk, DEPTH RESOLUTION ADVANTAGES OF PLASMA SPUTTERING IN-DEPTH PROFILING OF CONDUCTIVE AND NONCONDUCTIVE MATERIALS, Surface & coatings technology, 106(1), 1998, pp. 60-65

Authors: DANG TA FRISK TA NESBELLA JK

Citation: Ta. Dang et al., ADVANTAGES OF A HIGH-FREQUENCY SQUARE-WAVE IN A SPUTTERED NEUTRAL MASS-SPECTROMETRY STUDY OF INSULATING MATERIALS, Surface and interface analysis, 24(2), 1996, pp. 86-90

Authors: DANG TA CHAU CN

Citation: Ta. Dang et Cn. Chau, ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS OF COOL WHITE PHOSPHORS COATED WITH SIO2 THIN-FILM, Journal of the Electrochemical Society, 143(1), 1996, pp. 302-305

Authors: DANG TA HILLIARD C

Citation: Ta. Dang et C. Hilliard, FACTORS INFLUENCING THE QUANTITATIVE COMPOSITIONAL ANALYSIS OF POWDERS IN SPUTTERED NEUTRAL MASS-SPECTROMETRY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 2348-2351