Authors: DAS UK BHATTACHARYYA TK CHAUDHURI P

Citation: Uk. Das et al., ENHANCED BORON DOPING IN AMORPHOUS AND MICROCRYSTALLINE SILICON BY ARDILUTION, Journal of physics. D, Applied physics, 30(24), 1997, pp. 3371-3377

Authors: DAS UK CHAUDHURI P KSHIRSAGAR ST

Citation: Uk. Das et al., EFFECT OF ARGON DILUTION ON THE STRUCTURE OF MICROCRYSTALLINE SILICONDEPOSITED FROM SILANE, Journal of applied physics, 80(9), 1996, pp. 5389-5397

Authors: CHAUDHURI P DAS UK

Citation: P. Chaudhuri et Uk. Das, CONTROL OF MICROSTRUCTURE AND OPTOELECTRONIC PROPERTIES OF SI-H FILMSBY ARGON DILUTION IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FROM SILANE, JPN J A P 1, 34(7A), 1995, pp. 3467-3473