Authors: DE SC TARUI H TERAKAWA A MARUYAMA E SAYAMA K NINOMIYA K TSUDA S NAKANO S

Citation: Sc. De et al., LOW-HYDROGEN-CONTENT, STABLE AMORPHOUS-SILICON THIN-FILMS PREPARED BYION-ASSISTED METHOD, JPN J A P 1, 33(10), 1994, pp. 5652-5656

Authors: MIDDYA AR DE SC RAY S

Citation: Ar. Middya et al., IMPROVEMENT IN THE PROPERTIES OF A-SIGE-H FILMS - ROLES OF DEPOSITIONRATE AND HYDROGEN DILUTION, Journal of applied physics, 73(9), 1993, pp. 4622-4630