Authors:
GRUNING U
GUJRATHI SC
POULIN S
DIAWARA Y
YELON A
Citation: U. Gruning et al., REMOTE OXYGEN-CONTAINING HYDROGEN PLASMA TREATMENT OF POROUS SILICON, Journal of applied physics, 75(12), 1994, pp. 8075-8079
Authors:
DIAWARA Y
LAFONTAINE H
CHAKER M
KIEFFER JC
PEPIN H
COCHRANE RW
CURRIE JF
HAGHIRIGOSNET AM
RAVET MF
ROUSSEAUX F
Citation: Y. Diawara et al., RAPID THERMAL ANNEALING FOR REDUCING STRESS IN TUNGSTEN X-RAY MASK ABSORBER, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(2), 1993, pp. 296-300