Authors:
YAMAGUCHI T
UPPILI S
LEE JS
KAWAMOTO GH
DOSLUOGLU T
SIMPKINS S
Citation: T. Yamaguchi et al., PROCESS AND DEVICE CHARACTERIZATION FOR A 30-GHZ FT SUBMICROMETER DOUBLE POLY-SI BIPOLAR TECHNOLOGY USING BF2-IMPLANTED BASE WITH RAPID THERMAL-PROCESS, I.E.E.E. transactions on electron devices, 40(8), 1993, pp. 1484-1495