Authors:
HYMAN E
TSANG K
DROBOT A
LANE B
CASEY J
POST R
Citation: E. Hyman et al., ONE-POINT NUMERICAL MODELING OF MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION DIAMOND DEPOSITION REACTORS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1474-1479