Authors: Santucci, S Lozzi, L Passacantando, M Phani, AR Palumbo, E Bracchitta, G De Tommasis, R Torsi, A Alfonsetti, R Moccia, G

Citation: S. Santucci et al., Properties of stacked dielectric films composed of SiO2/Si3N4/SiO2, J NON-CRYST, 245, 1999, pp. 224-231