Citation: M. Bolte et al., 2,2 '-[(3-hydroxyphenyl)methylene]bis(3-hydroxy-5,5-dimethyl-2-cyclohexen-1-one) hydrate, ACT CRYST E, 57, 2001, pp. O170-o171
Citation: M. Bolte et al., Redetermination of 3,3,6,6-tetramethyl-4a-hydroxy-9(ortho-methoxyphenyl)-2,3,4,4a,5,6,7,8,9,9a-deca-hydro-1H-xanthene-1,8-dione at 173 K, ACT CRYST E, 57, 2001, pp. o172-o173
Authors:
Degen, A
Abedinov, N
Gotszalk, T
Sossna, E
Kratzenberg, M
Rangelow, IW
Citation: A. Degen et al., Stress analysis in Si membranes for open stencil masks and mini-reticles using double bulging and resonance methods, MICROEL ENG, 57-8, 2001, pp. 425-432
Citation: M. Bolte et al., Two diastereomers of 9-(2,6-dichlorophenyl)-4a-hydroxy-3,3,6,6-tetra-methyl-1,2,3,4,4a,5,6,7,8,9a-deca-hydroxanthene-1,8-dione in the same crystal, ACT CRYST C, 57, 2001, pp. 444-445
Authors:
Wyss, P
Schwarz, V
Dobler-Girdziunaite, D
Hornung, R
Walt, H
Degen, A
Fehr, MK
Citation: P. Wyss et al., Photodynamic therapy of locoregional breast cancer recurrences using a chlorin-type photosensitizer, INT J CANC, 93(5), 2001, pp. 720-724
Authors:
Riehn, C
Degen, A
Weichert, A
Bolte, M
Egert, E
Brutschy, B
Tarakeshwar, P
Kim, KS
Citation: C. Riehn et al., Molecular structure of p-cyclohexylaniline. Comparison of results obtainedby X-ray diffraction with gas phase laser experiments and ab initio calculations, J PHYS CH A, 104(49), 2000, pp. 11593-11600
Citation: A. Degen et M. Kosec, Effect of pH and impurities on the surface charge of zinc oxide in aqueoussolution, J EUR CERAM, 20(6), 2000, pp. 667-673
Authors:
Ehrmann, A
Struck, T
Chalupka, A
Haugeneder, E
Loschner, H
Butschke, J
Irmscher, M
Letzkus, F
Springer, R
Degen, A
Rangelow, IW
Shi, F
Sossna, E
Volland, B
Engelstad, R
Lovell, E
Tejeda, R
Citation: A. Ehrmann et al., Comparison of silicon stencil mask distortion measurements with finite element analysis, J VAC SCI B, 17(6), 1999, pp. 3107-3111
Authors:
Hudek, P
Hrkut, P
Drzik, M
Kostic, I
Belov, M
Torres, J
Wasson, J
Wolfe, JC
Degen, A
Rangelow, IW
Voigt, J
Butschke, J
Letzkus, F
Springer, R
Ehrmann, A
Kaesmaier, R
Kragler, K
Mathuni, J
Haugeneder, E
Loschner, H
Citation: P. Hudek et al., Directly sputtered stress-compensated carbon protective layer for silicon stencil masks, J VAC SCI B, 17(6), 1999, pp. 3127-3131
Citation: A. Degen et J. Macek, Preparation of submicrometer nickel powders by the reduction from nonaqueous media, NANOSTR MAT, 12(1-4), 1999, pp. 225-228