Authors: Baumvol, IJR Krug, C Stedile, FC Green, ML Jacobson, DC Eaglesham, D Bernstein, JD Shao, J Denholm, AS Kellerman, PL

Citation: Ijr. Baumvol et al., Ultrathin silicon oxynitride film formation by plasma immersion nitrogen implantation, APPL PHYS L, 74(6), 1999, pp. 806-808