Authors:
Nottola, A
Gerardino, A
Gentili, M
Di Fabrizio, E
Cabrini, S
Melpignano, P
Rotaris, G
Citation: A. Nottola et al., Fabrication of semi-continuous profile diffractive optical elements for beam shaping by electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 325-328
Authors:
Massimi, A
Di Fabrizio, E
Gentili, M
Piccinin, D
Martinelli, M
Citation: A. Massimi et al., Fabrication of optical wave-guides in silica-on-silicon by nickel electroplating and conventional reactive ion etching, JPN J A P 1, 38(10), 1999, pp. 6150-6153
Citation: E. Di Fabrizio et M. Gentili, X-ray multilevel zone plate fabrication by means of electron-beam lithography: Toward high-efficiency performances, J VAC SCI B, 17(6), 1999, pp. 3439-3443
Authors:
Kiskinova, M
Marsi, K
Di Fabrizio, E
Gentili, M
Citation: M. Kiskinova et al., Synchrotron radiation scanning photoemission microscopy: Instrumentation and application in surface science, SURF REV L, 6(2), 1999, pp. 265-286
Authors:
Di Fabrizio, E
Gentili, M
Mastrogiacomo, L
Citation: E. Di Fabrizio et al., Fabrication of self-standing, size-adjustable nickel structures with nanometer resolution., MICROEL ENG, 46(1-4), 1999, pp. 161-164
Authors:
Gerardino, A
Gentili, M
Di Fabrizio, E
Calarco, R
Mastrogiacomo, L
Citation: A. Gerardino et al., Study of nanometer resolution resist slope for the UVIII chemically amplified resist., MICROEL ENG, 46(1-4), 1999, pp. 201-204
Authors:
Di Fabrizio, E
Nucara, A
Gentili, M
Cingolani, R
Citation: E. Di Fabrizio et al., Design of a beamline for soft and deep lithography on third generation synchrotron radiation source, REV SCI INS, 70(3), 1999, pp. 1605-1613
Authors:
Kaulich, B
Oestreich, S
Salome, M
Barrett, R
Susini, J
Wilhein, T
Di Fabrizio, E
Gentili, M
Charalambous, P
Citation: B. Kaulich et al., Feasibility of transmission x-ray microscopy at 4 keV with spatial resolutions below 150 nm, APPL PHYS L, 75(26), 1999, pp. 4061-4063