Authors: Doh, HH Horiike, Y

Citation: Hh. Doh et Y. Horiike, Gas residence time effects on plasma parameters: Comparison between Ar andC4F8, JPN J A P 1, 40(5A), 2001, pp. 3419-3426

Authors: Doh, HH Chu, C Chi, KK Moon, JT

Citation: Hh. Doh et al., Surface analysis for selective SiO2 etching by reflectance photoelastic modulated fourier transform infrared spectroscopy, JPN J A P 1, 40(10), 2001, pp. 6109-6114