Authors: Hirscher, S Kaesmaier, R Domke, WD Wolter, A Loschner, H Cekan, E Horner, C Zeininger, M Ochsenhirt, J

Citation: S. Hirscher et al., Resist process development for sub-100-nm ion projection lithography, MICROEL ENG, 57-8, 2001, pp. 517-530

Authors: Cao, HB Nealey, PF Domke, WD

Citation: Hb. Cao et al., Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms, J VAC SCI B, 18(6), 2000, pp. 3303-3307

Authors: Elian, K Domke, WD Gunther, E Irmscher, M

Citation: K. Elian et al., Sub quarter-micron bilayer electron beam resist with enhanced sensitivity, MICROEL ENG, 45(4), 1999, pp. 319-327