Authors:
Evstratov, IY
Kalaev, VV
Nabokov, VN
Zhmakin, AI
Makarov, YN
Abramov, AG
Ivanov, NG
Rudinsky, EA
Smirnov, EM
Lowry, SA
Dornberger, E
Virbulis, J
Tomzig, E
Von Ammon, W
Citation: Iy. Evstratov et al., Global model of Czochralski silicon growth to predict oxygen content and thermal fluctuations at the melt-crystal interface, MICROEL ENG, 56(1-2), 2001, pp. 139-142
Authors:
Evstratov, IY
Kalaev, VV
Zhmakin, AI
Makarov, YN
Abramov, AG
Ivanov, NG
Smirnov, EM
Dornberger, E
Virbulis, J
Tomzig, E
von Ammon, W
Citation: Iy. Evstratov et al., Modeling analysis of unsteady three-dimensional turbulent melt flow duringCzochralski growth of Si crystals, J CRYST GR, 230(1-2), 2001, pp. 22-29
Authors:
Virbulis, J
Wetzel, T
Muiznieks, A
Hanna, B
Dornberger, E
Tomzig, E
Muhlbauer, A
von Ammon, W
Citation: J. Virbulis et al., Numerical investigation of silicon melt flow in large diameter CZ-crystal growth under the influence of steady and dynamic magnetic fields, J CRYST GR, 230(1-2), 2001, pp. 92-99
Authors:
Muhe, A
Backofen, R
Fainberg, J
Muller, G
Dornberger, E
Tomzig, E
von Ammon, W
Citation: A. Muhe et al., Oxygen distribution in silicon melt during a standard Czochralski process studied by sensor measurements and comparison to numerical simulation, J CRYST GR, 199, 1999, pp. 409-413
Authors:
Sinno, T
Susanto, H
Brown, RA
von Ammon, W
Dornberger, E
Citation: T. Sinno et al., Boron retarded self-interstitial diffusion in Czochralski growth of silicon crystals and its role in oxidation-induced stacking-fault ring dynamics, APPL PHYS L, 75(11), 1999, pp. 1544-1546