Authors: Eddy, CR Leonhardt, D Douglass, SR Shamamian, VA Thoms, BD Butler, JE

Citation: Cr. Eddy et al., Characterization of high density CH4/H-2/Ar plasmas for compound semiconductor etching, J VAC SCI A, 17(3), 1999, pp. 780-792

Authors: Eddy, CR Leonhardt, D Douglass, SR Thoms, BD Shamamian, VA Butler, JE

Citation: Cr. Eddy et al., Characterization of Cl-2/Ar high density plasmas for semiconductor etching, J VAC SCI A, 17(1), 1999, pp. 38-51