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Results: 1-3 |
Results: 3
Use of orthogonal polynomial functions for endpoint detection during plasma etching of patterned wafers
Authors: Rietman, EA Layadi, N Downey, SW
Citation: Ea. Rietman et al., Use of orthogonal polynomial functions for endpoint detection during plasma etching of patterned wafers, J VAC SCI B, 18(5), 2000, pp. 2500-2504
Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage
Authors: Malyshev, MV Donnelly, VM Downey, SW Colonell, JI Layadi, N
Citation: Mv. Malyshev et al., Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage, J VAC SCI A, 18(3), 2000, pp. 849-859
Nanoscale elemental imaging of semiconductor materials using focused ion beam secondary ion mass spectrometry
Authors: Stevie, FA Downey, SW Brown, SR Shofner, TL Decker, MA Dingle, T Christman, L
Citation: Fa. Stevie et al., Nanoscale elemental imaging of semiconductor materials using focused ion beam secondary ion mass spectrometry, J VAC SCI B, 17(6), 1999, pp. 2476-2482
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