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Fabrication and calibration of a gas sensor based on chemically vapor deposited WO3 films on silicon substrates Application to H-2 sensing
Authors:
Davazoglou, D Dritsas, T
Citation:
D. Davazoglou et T. Dritsas, Fabrication and calibration of a gas sensor based on chemically vapor deposited WO3 films on silicon substrates Application to H-2 sensing, SENS ACTU-B, 77(1-2), 2001, pp. 359-362
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