Authors: Drusedau, TP Koppenhagen, K Blasing, J John, TM

Citation: Tp. Drusedau et al., Texturing effects in molybdenum and aluminum nitride films correlated to energetic bombardment during sputter deposition, APPL PHYS A, 72(5), 2001, pp. 541-550

Authors: Drusedau, TP Lohmann, M Klabunde, F John, TM

Citation: Tp. Drusedau et al., Investigations on energy fluxes in magnetron sputter-deposition: implications for texturing and nanoporosity of metals, SURF COAT, 133, 2000, pp. 126-130

Authors: Drusedau, TP Blasing, J

Citation: Tp. Drusedau et J. Blasing, Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen, THIN SOL FI, 377, 2000, pp. 27-31

Authors: Drusedau, TP Bock, T John, TM Klabunde, F Eckstein, W

Citation: Tp. Drusedau et al., Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations, J VAC SCI A, 17(5), 1999, pp. 2896-2905

Authors: Drusedau, TP Diez, A Blasing, J

Citation: Tp. Drusedau et al., Deposition of nanocrystalline silicon mediated by ultrathin aluminum underlayers by PCVD and sputter-deposition at 500 K, THIN SOL FI, 337(1-2), 1999, pp. 41-44