Authors: Zhang, F de Beeck, MO Schaekers, M Ronse, K Conley, W Gopalan, P Gangala, H Dusa, M Bendik, J

Citation: F. Zhang et al., CD control using SiONBARL processing for sub-0.25 mu m lithography, MICROEL ENG, 46(1-4), 1999, pp. 51-54