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Results: 1-8 |
Results: 8
EXPANDERS USED FOR PRETREATMENT OF OILSEE DS
Authors: ELSTNER F
Citation: F. Elstner, EXPANDERS USED FOR PRETREATMENT OF OILSEE DS, Fett, 99(4), 1997, pp. 147-152
INVESTIGATION OF MAGNETRON-SPUTTERED TITANIUM NITRIDE FILMS USING POSITRON-ANNIHILATION SPECTROSCOPY
Authors: KNIGHTS AP SALEH AS RICEEVANS PC BULL SJ ELSTNER F RICHTER F KUPFER H
Citation: Ap. Knights et al., INVESTIGATION OF MAGNETRON-SPUTTERED TITANIUM NITRIDE FILMS USING POSITRON-ANNIHILATION SPECTROSCOPY, Journal of physics. Condensed matter, 8(14), 1996, pp. 2479-2486
COMPARATIVE-STUDY OF MECHANICAL AND STRUCTURAL-PROPERTIES OF CRN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING AND VACUUM-ARC EVAPORATION
Authors: GAUTIER C MOUSSAOUI H ELSTNER F MACHET J
Citation: C. Gautier et al., COMPARATIVE-STUDY OF MECHANICAL AND STRUCTURAL-PROPERTIES OF CRN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING AND VACUUM-ARC EVAPORATION, Surface & coatings technology, 87-8(1-3), 1996, pp. 254-262
THE LOWER CRETACEOUS (BERRIASIAN AND VALANGINIAN) IN NW GERMANY
Authors: ELSTNER F MUTTERLOSE J
Citation: F. Elstner et J. Mutterlose, THE LOWER CRETACEOUS (BERRIASIAN AND VALANGINIAN) IN NW GERMANY, Cretaceous research, 17(1), 1996, pp. 119-133
A COMPARATIVE-STUDY OF STRUCTURE AND RESIDUAL-STRESS IN CHROMIUM NITRIDE FILMS DEPOSITED BY VACUUM ARC EVAPORATION, ION PLATING, AND DC MAGNETRON SPUTTERING
Authors: ELSTNER F GAUTIER C MOUSSAOUI H PIOT O MACHET J
Citation: F. Elstner et al., A COMPARATIVE-STUDY OF STRUCTURE AND RESIDUAL-STRESS IN CHROMIUM NITRIDE FILMS DEPOSITED BY VACUUM ARC EVAPORATION, ION PLATING, AND DC MAGNETRON SPUTTERING, Physica status solidi. a, Applied research, 158(2), 1996, pp. 505-521
COMPARATIVE-STUDY OF THE STRESS IN CHROMIUM FILMS DEPOSITED BY VACUUM-ARC EVAPORATION, VACUUM EVAPORATION, AND DC MAGNETRON SPUTTERING
Authors: ELSTNER F GAUTIER C PIOT O CONTOUX G COSSET F NARDOU F MACHET J
Citation: F. Elstner et al., COMPARATIVE-STUDY OF THE STRESS IN CHROMIUM FILMS DEPOSITED BY VACUUM-ARC EVAPORATION, VACUUM EVAPORATION, AND DC MAGNETRON SPUTTERING, Physica status solidi. a, Applied research, 154(2), 1996, pp. 669-679
ACTIVATION-ENERGY OF POINT-DEFECT DIFFUSION IN LOW-TEMPERATURE DEPOSITED TIN
Authors: ELSTNER F KUPFER H RICHTER F
Citation: F. Elstner et al., ACTIVATION-ENERGY OF POINT-DEFECT DIFFUSION IN LOW-TEMPERATURE DEPOSITED TIN, Physica status solidi. a, Applied research, 147(2), 1995, pp. 373-377
STRUCTURE AND PROPERTIES OF TITANIUM NITRIDE THIN-FILMS DEPOSITED AT LOW-TEMPERATURES USING DIRECT-CURRENT MAGNETRON SPUTTERING
Authors: ELSTNER F EHRLICH A GIEGENGACK H KUPFER H RICHTER F
Citation: F. Elstner et al., STRUCTURE AND PROPERTIES OF TITANIUM NITRIDE THIN-FILMS DEPOSITED AT LOW-TEMPERATURES USING DIRECT-CURRENT MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 476-483
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