Citation: W. Ensinger et K. Volz, MICROSTRUCTURE AND COMPOSITION OF TITANIUM NITRIDE FORMED BY ION-BEAM-ENHANCED NITROGEN SORPTION OF EVAPORATED TITANIUM UNDER ARGON ION IRRADIATION, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 253(1-2), 1998, pp. 234-239
Citation: W. Ensinger, SEMICONDUCTOR PROCESSING BY PLASMA IMMERSION ION-IMPLANTATION, Materials science & engineering. A, Structural materials: properties, microstructure and processing, 253(1-2), 1998, pp. 258-268
Authors:
VOLZ K
ENSINGER W
REIBER W
RAUSCHENBACH B
STRITZKER B
Citation: K. Volz et al., FORMATION OF SILICON-CARBIDE AND AMORPHOUS-CARBON FILMS BY PULSE BIASING SILICON TO A HIGH-VOLTAGE IN A METHANE ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA, Journal of materials research, 13(7), 1998, pp. 1765-1768
Citation: K. Volz et al., STRUCTURAL INVESTIGATIONS OF CHROMIUM NITRIDE FILMS FORMED BY ION-BEAM-ASSISTED DEPOSITION, Surface & coatings technology, 109(1-3), 1998, pp. 303-307
Citation: W. Ensinger et A. Schroer, ION-BEAM-ASSISTED DEPOSITION OF CARBIDE AND CARBONITRIDE OF TITANIUM AT LOW SUBSTRATE-TEMPERATURE, Surface & coatings technology, 104, 1998, pp. 168-172
Citation: W. Ensinger et al., TREATMENT UNIFORMITY OF PLASMA IMMERSION ION-IMPLANTATION STUDIED WITH 3-DIMENSIONAL MODEL SYSTEMS, Surface & coatings technology, 104, 1998, pp. 218-221
Authors:
VOLZ K
ENSINGER W
STRITZKER B
RAUSCHENBACH B
Citation: K. Volz et al., STRUCTURAL INVESTIGATIONS OF TITANIUM NITRIDE FILMS FORMED BY PLASMA IMMERSION ION-IMPLANTATION, Surface & coatings technology, 104, 1998, pp. 257-261
Authors:
LOINAZ A
RINNER M
ALONSO F
ONATE JI
ENSINGER W
Citation: A. Loinaz et al., EFFECTS OF PLASMA IMMERSION ION-IMPLANTATION OF OXYGEN ON MECHANICAL-PROPERTIES AND MICROSTRUCTURE OF TI6AL4V, Surface & coatings technology, 104, 1998, pp. 262-267
Citation: W. Ensinger, MODIFICATION OF MECHANICAL AND CHEMICAL SURFACE-PROPERTIES OF METALS BY PLASMA IMMERSION ION-IMPLANTATION, Surface & coatings technology, 101(1-3), 1998, pp. 341-352
Authors:
RINNER M
VOLZ K
ENSINGER W
ASSMANN W
RAUSCHENBACH B
Citation: M. Rinner et al., COMPOSITION AND MICROSTRUCTURE OF TITANIUM NITRIDE FORMED ON TI6AL4V BY NITROGEN PLASMA IMMERSION ION-IMPLANTATION, Surface & coatings technology, 101(1-3), 1998, pp. 366-371
Authors:
VOLZ K
ENSINGER W
RAUSCHENBACH B
STRITZKER B
Citation: K. Volz et al., FORMATION OF SILICON-CARBIDE AND NITRIDE BY ECR MICROWAVE PLASMA IMMERSION ION-IMPLANTATION, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 663-669
Citation: W. Ensinger et Hr. Muller, NOBLE-METAL DEPOSITION ON ALUMINUM-OXIDE POWDER SURFACES BY ION-BEAM SPUTTERING, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 693-698
Authors:
ENSINGER W
VOLZ K
SCHRAG G
STRITZKER B
RAUSCHENBACH B
Citation: W. Ensinger et al., FORMATION OF SILICON-NITRIDE LAYERS BY NITROGEN ION IRRADIATION OF SILICON BIASED TO A HIGH-VOLTAGE IN AN ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA, Applied physics letters, 72(10), 1998, pp. 1164-1166
Citation: W. Ensinger et al., LATERAL IMPLANTATION HOMOGENEITY OF WEDGE-SHAPED SAMPLES TREATED BY PLASMA IMMERSION ION-IMPLANTATION, Surface & coatings technology, 94-5(1-3), 1997, pp. 352-355
Citation: W. Ensinger et M. Kiuchi, THE FORMATION OF CHROMIUM NITROGEN PHASES BY NITROGEN ION-IMPLANTATION DURING CHROMIUM DEPOSITION AS A FUNCTION OF ION-TO-ATOM ARRIVAL RATIO/, Surface & coatings technology, 94-5(1-3), 1997, pp. 433-436
Authors:
ENSINGER W
KLEIN J
USEDOM P
RAUSCHENBACH B
Citation: W. Ensinger et al., CHARACTERISTIC FEATURES OF AN APPARATUS FOR PLASMA IMMERSION ION-IMPLANTATION AND PHYSICAL VAPOR-DEPOSITION, Surface & coatings technology, 93(2-3), 1997, pp. 175-180
Authors:
ALONSO F
RINNER M
LOINAZ A
ONATE JI
ENSINGER W
RAUSCHENBACH B
Citation: F. Alonso et al., CHARACTERIZATION OF TI-6AL-4V MODIFIED BY NITROGEN PLASMA IMMERSION ION-IMPLANTATION, Surface & coatings technology, 93(2-3), 1997, pp. 305-308
Citation: W. Ensinger, CHEMICAL-PROPERTIES OF ION-BEAM SPUTTER COATED METAL TUBES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 775-778
Citation: W. Ensinger, LOW-ENERGY ION ASSIST DURING DEPOSITION - AN EFFECTIVE TOOL FOR CONTROLLING THIN-FILM MICROSTRUCTURE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 796-808
Authors:
HOCHBAUER T
ENSINGER W
SCHRAG G
HARTMANN J
STRITZKER B
RAUSCHENBACH B
Citation: T. Hochbauer et al., HOMOGENEITY MEASUREMENTS OF PLASMA IMMERSION ION-IMPLANTED COMPLEX-SHAPED SAMPLES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 869-872
Authors:
HARTMANN J
ENSINGER W
KONIGER A
STRITZKER B
RAUSCHENBACH B
Citation: J. Hartmann et al., FORMATION OF TITANIUM NITRIDE COATINGS BY NITROGEN PLASMA IMMERSION ION-IMPLANTATION OF EVAPORATED TITANIUM FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3144-3146
Citation: W. Ensinger, CORROSION AND WEAR PROTECTION OF TUBE INNER WALLS BY ION-BEAM SPUTTERCOATING, Surface & coatings technology, 87-8(1-3), 1996, pp. 438-442
Authors:
ENSINGER W
HARTMANN J
BENDER H
THOMAE RW
KONIGER A
STRITZKER B
RAUSCHENBACH B
Citation: W. Ensinger et al., NIOBIUM OXIDE THIN-FILMS FORMED BY PLASMA IMMERSION OXYGEN-ION IMPLANTATION, Surface & coatings technology, 85(1-2), 1996, pp. 80-85
Citation: W. Ensinger, FORMATION OF CARBON-BASED SUPERHARD MATERIALS BY CONDENSATION OF EVAPORATED CARBON UNDER RARE-GAS OR NITROGEN ION IRRADIATION, Surface & coatings technology, 84(1-3), 1996, pp. 363-375