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Results: 2
SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry
Authors: Cole, DA Shallenberger, JR Novak, SW Moore, RL Edgell, MJ Smith, SP Hitzman, CJ Kirchhoff, JF Principe, E Nieveen, W Huang, FK Biswas, S Bleiler, RJ Jones, K
Citation: Da. Cole et al., SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry, J VAC SCI B, 18(1), 2000, pp. 440-444
Recent advances in secondary ion mass spectrometry to characterize ultralow energy ion implants
Authors: Chia, VKF Mount, GR Edgell, MJ Magee, CW
Citation: Vkf. Chia et al., Recent advances in secondary ion mass spectrometry to characterize ultralow energy ion implants, J VAC SCI B, 17(5), 1999, pp. 2345-2351
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