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Authors:
Lohner, T
Fried, M
Khanh, NQ
Petrik, P
Wormeester, H
El-Sherbiny, MA
Citation: T. Lohner et al., Comparative study of ion implantation caused anomalous surface damage in silicon studied by spectroscopic ellipsometry and Rutherford backscattering spectrometry, NUCL INST B, 147(1-4), 1999, pp. 90-95