Authors: Resnick, DJ Nordquist, K Dauksher, WJ Ainley, E Lu, B Mangat, P Weisbrod, E Martin, C Chang, J Englestad, R Lovell, E Ivin, V

Citation: Dj. Resnick et al., Critical dimension issues for 200 mm electron projection masks, JPN J A P 1, 39(12B), 2000, pp. 6874-6880