Authors:
Suemitsu, M
Enta, Y
Miyanishi, Y
Takegawa, Y
Miyamoto, N
Citation: M. Suemitsu et al., Transition from random to island growth mode during Si(100)-(2 x 1) dry oxidation and its description with autocatalytic reaction model, APPL SURF S, 162, 2000, pp. 293-298
Authors:
Suemitsu, M
Enta, Y
Takegawa, Y
Miyamoto, N
Citation: M. Suemitsu et al., Mode transition between growth and decomposition of oxides on Si(001): Kinetically determined critical coverage for oxidation, APPL PHYS L, 77(20), 2000, pp. 3179-3181
Authors:
Hori, T
Sakamoto, H
Takakuwa, Y
Enta, Y
Kato, H
Miyamoto, N
Citation: T. Hori et al., In situ observation of a high-temperature Si(001) surface during SiH2Cl2 exposure by photoelectron spectroscopy, THIN SOL FI, 344, 1999, pp. 354-360