Authors: AZUMA T OHIWA T OKUMURA K FARRELL T NUNES R DOBUZINSKY D FICHTL G GUTMANN A

Citation: T. Azuma et al., IMPACT OF REDUCED RESIST THICKNESS ON DEEP-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4246-4251