Citation: Ak. Raychaudhuri et al., AT-WAVELENGTH CHARACTERIZATION OF AN EXTREME-ULTRAVIOLET CAMERA FROM LOW TO MID-SPATIAL FREQUENCIES WITH A COMPACT LASER-PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2462-2466
Authors:
RAYCHAUDHURI AK
KRENZ KD
NISSEN RP
HANEY SJ
FIELDS CH
SWEATT WC
MACDOWELL AA
Citation: Ak. Raychaudhuri et al., INITIAL RESULTS FROM AN EXTREME-ULTRAVIOLET INTERFEROMETER OPERATING WITH A COMPACT LASER-PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3964-3968
Authors:
FIELDS CH
OLDHAM WG
RAYCHAUDHURI AK
KRENZ KD
STULEN RH
Citation: Ch. Fields et al., DIRECT AERIAL IMAGE MEASUREMENTS TO EVALUATE THE PERFORMANCE OF AN EXTREME-ULTRAVIOLET PROJECTION LITHOGRAPHY SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4000-4003
Citation: Wn. Partlo et al., DIRECT AERIAL IMAGE MEASUREMENT AS A METHOD OF TESTING HIGH NUMERICALAPERTURE MICROLITHOGRAPHIC LENSES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2686-2691