Authors: BRUENGER WH TORKLER M BUCHMANN LM FINKELSTEIN W

Citation: Wh. Bruenger et al., CHEMICALLY AMPLIFIED DEEP-ULTRAVIOLET RESIST FOR POSITIVE TONE ION EXPOSURE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2355-2357

Authors: BRUNGER WH BUCHMANN LM NAUMANN F FRIEDRICH D FINKELSTEIN W MOHONDRO R

Citation: Wh. Brunger et al., DAMAGE CHARACTERIZATION OF ION-BEAM EXPOSED METAL-OXIDE-SEMICONDUCTORVARACTOR CELLS BY CHARGE TO BREAKDOWN MEASUREMENTS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2561-2564

Authors: BRUNGRE WH LOSCHNER H STENGL G FALLMANN W FINKELSTEIN W MELNGAILIS J

Citation: Wh. Brungre et al., EVALUATION OF CRITICAL DESIGN PARAMETERS OF AN ION PROJECTOR FOR 1-GBIT DRAM PRODUCTION, Microelectronic engineering, 27(1-4), 1995, pp. 323-326

Authors: CHALUPKA A STENGL G BUSCHBECK H LAMMER G VONACH H FISCHER R HAMMEL E LOSCHNER H NOWAK R WOLF P FINKELSTEIN W HILL RW BERRY IL HARRIOTT LR MELNGAILIS J RANDALL JN WOLFE JC STROH H WOLLNIK H MONDELLI AA PETILLO JJ LEUNG K

Citation: A. Chalupka et al., NOVEL ELECTROSTATIC COLUMN FOR ION PROJECTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3513-3517

Authors: HAMMEL E CHALUPKA A FEGERL J FISCHER R LAMMER G LOSCHNER H MALEK L NOWAK R STENGL G VONACH H WOLF P BRUNGER WH BUCHMANN LM TORKLER M CEKAN E FALLMANN W PASCHKE F STANGL G THALINGER F BERRY IL HARRIOTT LR FINKELSTEIN W HILL RW

Citation: E. Hammel et al., EXPERIMENTAL INVESTIGATION OF STOCHASTIC SPACE-CHARGE EFFECTS ON PATTERN RESOLUTION IN ION PROJECTION LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3533-3538

Authors: BRUNGER WH BUCHMANN LM TORKLER MA FINKELSTEIN W

Citation: Wh. Brunger et al., ION PROJECTION LITHOGRAPHY OVER WAFER TOPOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3547-3549