Citation: A. Friedl et al., IN-SITU CHARACTERIZATION OF PLASMA-DEPOSITED A-C-H THIN-FILMS BY SPECTROSCOPIC INFRARED ELLIPSOMETRY, Review of scientific instruments, 65(9), 1994, pp. 2882-2889
Authors:
HEIN S
SCHOLZ D
FUJITANI N
RENNOLLET H
BRAND T
FRIEDL A
SCHAPER J
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