Authors:
FROTSCHER U
ROSSOW U
EBERT M
PIETRYGA C
RICHTER W
BERGER MG
ARENSFISCHER R
MUNDER H
Citation: U. Frotscher et al., INVESTIGATION OF DIFFERENT OXIDATION PROCESSES FOR POROUS SILICON STUDIED BY SPECTROSCOPIC ELLIPSOMETRY, Thin solid films, 276(1-2), 1996, pp. 36-39
Authors:
ROSSOW U
FROTSCHER U
THONISSEN M
BERGER MG
FROHNHOFF S
MUNDER H
RICHTER W
Citation: U. Rossow et al., INFLUENCE OF THE FORMATION CONDITIONS ON THE MICROSTRUCTURE OF POROUSSILICON LAYERS STUDIED BY SPECTROSCOPIC ELLIPSOMETRY, Thin solid films, 255(1-2), 1995, pp. 5-8
Citation: U. Rossow et al., INSITU OPTICAL CHARACTERIZATION WITH MONOLAYER SENSITIVITY - THE AS-TERMINATED SI(111) SURFACE, Surface science, 287, 1993, pp. 718-721