Authors: FUCHS GM FRIEDBACHER G SCHWARZBACH D BOUVERESSE E PROHASKA T GRASSERBAUER M HAUBNER R LUX B

Citation: Gm. Fuchs et al., AFM INVESTIGATION OF SILICON SUBSTRATES FOR CHEMICAL-VAPOR-DEPOSITIONOF DIAMOND FILMS, Fresenius' journal of analytical chemistry, 353(5-8), 1995, pp. 698-701

Authors: FUCHS GM PROHASKA T FRIEDBACHER G HUTTER H GRASSERBAUER M

Citation: Gm. Fuchs et al., MAXIMUM-ENTROPY DECONVOLUTION OF AFM AND STM IMAGES, Fresenius' journal of analytical chemistry, 351(2-3), 1995, pp. 143-147