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Authors: FULTZ WW NEUDECK GW
Citation: Ww. Fultz et Gw. Neudeck, AMMONIA NITRIDATION OF THERMAL POLYOXIDE TO ELIMINATE EPITAXIAL AMBIENT INDUCED DIELECTRIC PINHOLE FORMATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3465-3469

Authors: SHERMAN JM NEUDECK GW DENTON JP BASHIR R FULTZ WW
Citation: Jm. Sherman et al., ELIMINATION OF THE SIDEWALL DEFECTS IN SELECTIVE EPITAXIAL-GROWTH (SEG) OF SILICON FOR A DIELECTRIC ISOLATION TECHNOLOGY, IEEE electron device letters, 17(6), 1996, pp. 267-269
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