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Results: 1
Plasma source for ion and electron beam lithography
Authors:
Lee, Y Gough, RA Leung, KN Vujic, J Williams, MD Zahir, N Fallman, W Tockler, M Bruenger, W
Citation:
Y. Lee et al., Plasma source for ion and electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3367-3369
Risultati:
1-1
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