Authors: Fan, ZN Zeng, XC Kwok, DTK Chu, PK

Citation: Zn. Fan et al., Surface hydrogen incorporation and profile broadening caused by sheath expansion in hydrogen plasma immersion ion implantation, IEEE PLAS S, 28(2), 2000, pp. 371-375

Authors: Fan, ZN Zeng, XC Chu, PK Chan, C Watanabe, M

Citation: Zn. Fan et al., Surface metal contamination on silicon wafers after hydrogen plasma immersion ion implantation, NUCL INST B, 155(1-2), 1999, pp. 75-78

Authors: Fan, ZN Chu, PK Cheung, NW Chan, C

Citation: Zn. Fan et al., Thickness uniformity of silicon-on-insulator fabricated by plasma immersion ion implantation and ion cut, IEEE PLAS S, 27(2), 1999, pp. 633-636

Authors: Tian, XB Fan, ZN Zeng, XC Zeng, ZM Tang, BY Chu, PK

Citation: Xb. Tian et al., In situ sample temperature measurement in plasma immersion ion implantation, REV SCI INS, 70(6), 1999, pp. 2818-2821

Authors: Fan, ZN Chen, QC Chu, PK Chan, C

Citation: Zn. Fan et al., Low pressure plasma immersion ion implantation of silicon, IEEE PLAS S, 26(6), 1998, pp. 1661-1668