Authors: Sanchez, O Martinez-Duart, JM Gomez-Sanroman, RJ Perez-Casero, R Aguilar, MA Falcony, C Fernandez-Gutierrez, F Hernandez-Velez, M

Citation: O. Sanchez et al., SiOxNy Films deposited with SiCl4 by remote plasma enhanced CVD, J MATER SCI, 34(12), 1999, pp. 3007-3012