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Results: 2
Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas
Authors: Kastenmeier, BEE Matsuo, PJ Oehrlein, GS Ellefson, RE Frees, LC
Citation: Bee. Kastenmeier et al., Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas, J VAC SCI A, 19(1), 2001, pp. 25-30
Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection
Authors: Li, X Schaepkens, M Oehrlein, GS Ellefson, RE Frees, LC Mueller, N Korner, N
Citation: X. Li et al., Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection, J VAC SCI A, 17(5), 1999, pp. 2438-2446
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