Authors: Reichardt, H Frenzel, A Schober, K

Citation: H. Reichardt et al., Environmentally friendly wafer production: NF3 remote microwave plasma forchamber cleaning, MICROEL ENG, 56(1-2), 2001, pp. 73-76

Authors: Frenzel, A Kutsuna, S Takeuchi, K Ibusuki, T

Citation: A. Frenzel et al., Solubility and reactivity of peroxyacetyl nitrate (PAN) in dilute aqueous salt solutions and in sulphuric acid, ATMOS ENVIR, 34(21), 2000, pp. 3641-3644

Authors: Balomenou, S Pitselis, G Polydoros, D Giannikos, A Vradis, A Frenzel, A Pliangos, C Putter, H Vayenas, CG

Citation: S. Balomenou et al., Electrochemical promotion of Pd, Fe and distributed Pt catalyst-electrodes, SOL ST ION, 136, 2000, pp. 857-862

Authors: Devolder, P Fittschen, C Frenzel, A Hippler, H Poskrebyshev, G Striebel, F Viskolcz, B

Citation: P. Devolder et al., Complete falloff curves for the unimolecular decomposition of i-propoxy radicals between 330 and 408 K, PCCP PHYS C, 1(4), 1999, pp. 675-681

Authors: Fittschen, C Frenzel, A Imrik, K Devolder, P

Citation: C. Fittschen et al., Rate constants for the reactions of C2H5O, i-C3H7O, and n-C3H7O with NO and O-2 as a function of temperature, INT J CH K, 31(12), 1999, pp. 860-866