Authors: Tian, XB Fu, RKY Wang, LW Chu, PK

Citation: Xb. Tian et al., Oxygen-induced nickel segregation in nitrogen plasma implanted AISI 304 stainless steel, MAT SCI E A, 316(1-2), 2001, pp. 200-204

Authors: Zeng, XC Tong, HH Fu, RKY Chu, PK Xu, ZJ Chen, QC

Citation: Xc. Zeng et al., Steady-state direct-current plasma immersion ion implantation using a multipolar magnetic field electron cyclotron resonance plasma source, J VAC SCI A, 19(6), 2001, pp. 2889-2892

Authors: Chu, PK Fu, RKY Zeng, XC Kwok, DTK

Citation: Pk. Chu et al., Metallic contamination in hydrogen plasma immersion ion implantation of silicon, J APPL PHYS, 90(8), 2001, pp. 3743-3749

Authors: Wang, LW Fu, RKY Zeng, X Chu, PK Cheung, WY Wong, SP

Citation: Lw. Wang et al., Damage in hydrogen plasma implanted silicon, J APPL PHYS, 90(4), 2001, pp. 1735-1739

Authors: Zeng, XC Fu, RKY Kwok, DTK Chu, PK

Citation: Xc. Zeng et al., Quasi-direct current plasma immersion ion implantation, APPL PHYS L, 79(19), 2001, pp. 3044-3046