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Results: 1-22 |
Results: 22

Authors: Birkholz, M Conrad, E Fuhs, W
Citation: M. Birkholz et al., Crystallinity of thin silicon films deposited at low temperatures: Combined effect of biasing and structuring the substrate, JPN J A P 1, 40(6A), 2001, pp. 4176-4180

Authors: Birkholz, M Selle, B Fuhs, W Christiansen, S Strunk, HP Reich, R
Citation: M. Birkholz et al., Amorphous-crystalline phase transition during the growth of thin films: The case of microcrystalline silicon - art. no. 085402, PHYS REV B, 6408(8), 2001, pp. 5402

Authors: Martinez, FL del Prado, A Martil, I Gonzalez-Diaz, G Bohne, W Fuhs, W Rohrich, J Selle, B Sieber, I
Citation: Fl. Martinez et al., Molecular models and activation energies for bonding rearrangement in plasma-deposited alpha-SiNx : H dielectric thin films treated by rapid thermal annealing - art. no. 245320, PHYS REV B, 6324(24), 2001, pp. 5320

Authors: Platen, J Selle, B Sieber, I Brehme, S Zeimer, U Fuhs, W
Citation: J. Platen et al., Low-temperature epitaxial growth of Si by electron cyclotron resonance chemical vapor deposition, THIN SOL FI, 381(1), 2001, pp. 22-30

Authors: Fuhs, W Kanschat, P Lips, K
Citation: W. Fuhs et al., Bandtails and defects in microcrystalline silicon (mu c-Si : H), J VAC SCI B, 18(3), 2000, pp. 1792-1795

Authors: Brehme, S Kanschat, P Lips, K Sieber, I Fuhs, W
Citation: S. Brehme et al., Electronic properties of highly P and B doped thin Si layers grown by ECR-CVD, MAT SCI E B, 69, 2000, pp. 232-237

Authors: Bohne, W Fuhs, W Rohrich, J Selle, B Gonzalez-Diaz, G Martil, I Martinez, FL del Prado, A
Citation: W. Bohne et al., Compositional analysis of amorphous SiNx : H films by ERDA and infrared spectroscopy, SURF INT AN, 30(1), 2000, pp. 534-537

Authors: Muller, R Kanschat, P von Aichberger, S Lips, K Fuhs, W
Citation: R. Muller et al., Identification of transport and recombination paths in homo and heterojunction silicon solar cells by electrically detected magnetic resonance, J NON-CRYST, 266, 2000, pp. 1124-1128

Authors: Rappich, J Lust, S Sieber, I Henrion, W Dohrmann, JK Fuhs, W
Citation: J. Rappich et al., Light trapping by formation of nanometer diameter wire-like structures on mu c-Si thin films, J NON-CRYST, 266, 2000, pp. 284-289

Authors: Kanschat, P Lips, K Fuhs, W
Citation: P. Kanschat et al., Identification of non-radiative recombination paths in microcrystalline silicon (mu c-Si : H), J NON-CRYST, 266, 2000, pp. 524-528

Authors: Lengsfeld, P Nickel, NH Fuhs, W
Citation: P. Lengsfeld et al., The role of hydrogen in the process of successive laser crystallization ofhydrogenated amorphous silicon, J NON-CRYST, 266, 2000, pp. 659-663

Authors: Birkholz, M Selle, B Conrad, E Lips, K Fuhs, W
Citation: M. Birkholz et al., Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition, J APPL PHYS, 88(7), 2000, pp. 4376-4379

Authors: Albohn, J Fussel, W Sinh, ND Kliefoth, K Fuhs, W
Citation: J. Albohn et al., Capture cross sections of defect states at the Si/SiO2 interface, J APPL PHYS, 88(2), 2000, pp. 842-849

Authors: Lengsfeld, P Nickel, NH Fuhs, W
Citation: P. Lengsfeld et al., Step-by-step excimer laser induced crystallization of a-Si : H, APPL PHYS L, 76(13), 2000, pp. 1680-1682

Authors: Bresler, MS Fuhs, W Gregorkiewicz, T Gusev, OB Pak, PE Terukov, EI Tsendin, KD Yassievich, IN
Citation: Ms. Bresler et al., Mechanism of excitation of erbium electroluminescence in amorphous silicon, PHYSICA B, 274, 1999, pp. 354-357

Authors: Albohn, J Fussel, W Sinh, ND Kliefoth, K Flietner, H Fuhs, W
Citation: J. Albohn et al., Two types of traps at the Si/SiO2 interface characterized by their cross sections, MICROEL ENG, 48(1-4), 1999, pp. 159-162

Authors: Fenske, F Fuhs, W Nebauer, E Schopke, A Selle, B Sieber, I
Citation: F. Fenske et al., Transparent conductive ZnO : Al films by reactive co-sputtering from separate metallic Zn and Al targets, THIN SOL FI, 344, 1999, pp. 130-133

Authors: Brehme, S Fenske, F Fuhs, W Nebauer, E Poschenrieder, M Selle, B Sieber, I
Citation: S. Brehme et al., Free-carrier plasma resonance effects and electron transport in reactivelysputtered degenerate ZnO : Al films, THIN SOL FI, 342(1-2), 1999, pp. 167-173

Authors: Hilmer, F Vajen, K Ratka, A Ackermann, H Fuhs, W Melsheimer, O
Citation: F. Hilmer et al., Numerical solution and validation of a dynamic model of solar collectors working with varying fluid flow rate, SOLAR ENERG, 65(5), 1999, pp. 305-321

Authors: Eisenbeiss, G Fuhs, W Hertlein, H Luther, J Nitsch, J Schmid, J Wittwer, V
Citation: G. Eisenbeiss et al., Basis for sustainability: Renewable energy sources, BRENN WARME, 51(5-6), 1999, pp. 40-45

Authors: Kudoyarova, VK Kuznetsov, AN Terukov, EI Gusev, OB Kudryavtsev, YA Ber, BY Gusinskii, GM Fuhs, W Weiser, G Kuehne, H
Citation: Vk. Kudoyarova et al., Influence of oxygen on the photoluminescence intensity of erbium (at 1.54 mu m) in erbium-doped a-Si : H films, SEMICONDUCT, 32(11), 1998, pp. 1234-1238

Authors: Lengsfeld, P Brehme, S Ehlers, G Lange, H Stusser, N Tomm, Y Fuhs, W
Citation: P. Lengsfeld et al., Anomalous Hall effect in beta-FeSi2, PHYS REV B, 58(24), 1998, pp. 16154-16159
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