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Authors: Nukaga, N Mitsuya, M Suzuki, T Nishi, Y Fujimoto, M Funakubo, H
Citation: N. Nukaga et al., Local epitaxial growth of (103) one-axis-oriented SrBi2Ta2O9 thin films prepared at low deposition temperature by metalorganic chemical vapor deposition and their electrical properties, JPN J A P 1, 40(9B), 2001, pp. 5595-5598

Authors: Aratani, M Nagashima, K Funakubo, H
Citation: M. Aratani et al., Preparation of Pb(Zr-x,Ti1-x)O-3 thin films by source gas pulse-introducedmetalorganic chemical vapor deposition, JPN J A P 1, 40(6A), 2001, pp. 4126-4130

Authors: Mitsuya, M Nukaga, N Saito, K Osada, M Funakubo, H
Citation: M. Mitsuya et al., Low temperature direct crystallization of SrBi2(Ta1-xNbx)(2)O-9 thin filmsby thermal metalorganic chemical vapor deposition and their properties, JPN J A P 1, 40(5A), 2001, pp. 3337-3342

Authors: Sakai, T Watanabe, T Cho, Y Matsuura, K Funakubo, H
Citation: T. Sakai et al., Characterization of ferroelectric property of c-axis- and non-c-axis-oriented epitaxially grown Bi2VO5.5 thin films, JPN J A P 1, 40(11), 2001, pp. 6481-6486

Authors: Osada, M Kakihana, M Mitsuya, M Watanabe, T Funakubo, H
Citation: M. Osada et al., Raman spectroscopic fingerprint of ferroelectric SrBi2Ta2O9 thin films: A rapid distinction method for fluorite and pyrochlore phases, JPN J A P 2, 40(8B), 2001, pp. L891-L893

Authors: Mitsuya, M Nukaga, N Watanabe, T Funakubo, H Saito, K
Citation: M. Mitsuya et al., Property improvement of 75 nm-thick directly-crystallized SrBi2Ta2O9 thin films by pulse-introduced metalorganic chemical vapor deposition at low temperature, JPN J A P 2, 40(7B), 2001, pp. L758-L760

Authors: Akiyama, K Ohya, S Takano, H Kieda, N Funakubo, H
Citation: K. Akiyama et al., Growth of beta-FeSi2 thin film on Si (111) by metal-organic chemical vapordeposition, JPN J A P 2, 40(5A), 2001, pp. L460-L462

Authors: Aratani, M Ozeki, T Funakubo, H
Citation: M. Aratani et al., Low temperature deposition of Pb(Zr,Ti)O-3 film by source gas pulse-introduced metalorganic chemical vapor deposition, JPN J A P 2, 40(4A), 2001, pp. L343-L345

Authors: Saito, K Ishikawa, K Saiki, A Yamaji, I Akai, T Funakubo, H
Citation: K. Saito et al., Residual strain analysis of epitaxial grown SBT thin films prepared by MOCVD, INTEGR FERR, 33(1-4), 2001, pp. 59-69

Authors: Liu, XD Funakubo, H Noda, S Komiyama, H
Citation: Xd. Liu et al., Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD, CHEM VAPOR, 7(6), 2001, pp. 253-259

Authors: Sekiguchi, N Komeda, T Funakubo, H Chabicovsky, R Nicolics, J Stangl, G
Citation: N. Sekiguchi et al., Microsensor for the measurement of water content in the human skin, SENS ACTU-B, 78(1-3), 2001, pp. 326-330

Authors: Nukaga, N Mitsuya, M Funakubo, H
Citation: N. Nukaga et al., Chemical stability of SrBi2Ta2O9 thin films prepared by metalorganic chemical vapor deposition, IEICE TR EL, E84C(6), 2001, pp. 791-795

Authors: Watanabe, T Funakubo, H Saito, K
Citation: T. Watanabe et al., Ferroelectric property of epitaxial Bi4Ti3O12 films prepared by metalorganic chemical vapor deposition, J MATER RES, 16(1), 2001, pp. 303-307

Authors: Ishikawa, K Watanabe, T Funakubo, H
Citation: K. Ishikawa et al., Preparation of Bi2WO6 thin films by metalorganic chemical vapor depositionand their electrical properties, THIN SOL FI, 392(1), 2001, pp. 128-133

Authors: Higashi, N Watanabe, T Saito, K Yamaji, I Akai, T Funakubo, H
Citation: N. Higashi et al., Crystal structure comparison between conductive SrRuO3 and CaRuO3 thin films, J CRYST GR, 229(1), 2001, pp. 450-456

Authors: Watanabe, T Funakubo, H Mizuhira, M Osada, M
Citation: T. Watanabe et al., Site definition and characterization of La-substituted Bi4Ti3O12 thin films prepared by metalorganic chemical vapor deposition, J APPL PHYS, 90(12), 2001, pp. 6533-6535

Authors: Nagashima, K Aratani, M Funakubo, H
Citation: K. Nagashima et al., Orientation dependence of ferroelectricity of epitaxially grown Pb(ZrxTi1-x)O-3 thin films prepared by metalorganic chemical vapor deposition, J APPL PHYS, 89(8), 2001, pp. 4517-4522

Authors: Watanabe, T Saiki, A Saito, K Funakubo, H
Citation: T. Watanabe et al., Film thickness dependence of ferroelectric properties of c-axis-oriented epitaxial Bi4Ti3O12 thin films prepared by metalorganic chemical vapor deposition, J APPL PHYS, 89(7), 2001, pp. 3934-3938

Authors: Liu, XD Funakubo, H Noda, S Komiyama, H
Citation: Xd. Liu et al., Influence of deposition temperature on the microstructure of Pb-Ti-Nb-O thin films by metallorganic chemical vapor deposition, J ELCHEM SO, 148(3), 2001, pp. C227-C230

Authors: Aratani, M Oikawa, T Ozeki, T Funakubo, H
Citation: M. Aratani et al., Epitaxial-grade polycrystalline Pb(Zr,Ti)O-3 film deposited at low temperature by pulsed-metalorganic chemical vapor deposition, APPL PHYS L, 79(7), 2001, pp. 1000-1002

Authors: Mitsuya, M Nukaga, N Watanabe, T Funakubo, H Saito, K Osada, M
Citation: M. Mitsuya et al., Low leakage current and good ferroelectric properties of SrBi2(Ta0.7Nb0.3)(2)O-9-Bi3TiTaO9 solid solution thin film, APPL PHYS L, 79(13), 2001, pp. 2067-2069

Authors: Saito, K Mitsuya, M Nukaga, N Yamaji, I Akai, T Funakubo, H
Citation: K. Saito et al., Method of distinguishing SrBi2Ta2O9 phase from fluorite phase using X-ray diffraction reciprocal space mapping, JPN J A P 1, 39(9B), 2000, pp. 5489-5495

Authors: Nukaga, N Mitsuya, M Funakubo, H
Citation: N. Nukaga et al., Low-temperature preparation of SrBi2Ta2O9 thin films by electron cyclotronresonance plasma-enhanced metalorganic chemical vapor deposition and theirelectrical properties, JPN J A P 1, 39(9B), 2000, pp. 5496-5500

Authors: Watanabe, T Funakubo, H
Citation: T. Watanabe et H. Funakubo, Orientation control of metalorganic chemical vapor deposition-Bi4Ti3O12 thin film by sequential source gas supply method, JPN J A P 1, 39(9A), 2000, pp. 5211-5216

Authors: Odagawa, H Cho, Y Funakubo, H Nagashima, K
Citation: H. Odagawa et al., Simultaneous observation of ferroelectric domain patterns by scanning nonlinear dielectric microscope and surface morphology by atomic force microscope, JPN J A P 1, 39(6B), 2000, pp. 3808-3810
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