Authors:
Vassiliev, VY
Lin, C
Fung, D
Hsieh, J
Sudijono, JL
Citation: Vy. Vassiliev et al., Properties and gap-fill capability of HPD-CVD phosphosilicate glass films for subquarter-micrometer ULSI device technology, EL SOLID ST, 3(2), 2000, pp. 80-83