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Development of SiNx LPCVD processes for microtechnological applications
Authors: Rousset, B Furgal, L Fadel, P Fulop, A Pujos, D Temple-Boyer, P
Citation: B. Rousset et al., Development of SiNx LPCVD processes for microtechnological applications, J PHYS IV, 11(PR3), 2001, pp. 937-944
Boron doped polysilicon deposition in a sector reactor: Specific phenomenaand properties
Authors: Scheid, E Furgal, L Vergnes, H
Citation: E. Scheid et al., Boron doped polysilicon deposition in a sector reactor: Specific phenomenaand properties, J PHYS IV, 9(P8), 1999, pp. 885-892
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