ACNP - Italian Periodicals Catalogue

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Results: 1-10 |

Results: 10

MODIFIED SPONTANEOUS EMISSION IN OLIGO(P-PHENYLENE VINYLENE) PLANAR MICROCAVITIES

Authors: BERTHELOT L TARDY J GAGNAIRE A JOSEPH J MASENELLI B GARRIGUES M TRAN VH RIGNEAULT H

Citation: L. Berthelot et al., MODIFIED SPONTANEOUS EMISSION IN OLIGO(P-PHENYLENE VINYLENE) PLANAR MICROCAVITIES, Optical materials, 9(1-4), 1998, pp. 25-33

CHARACTERIZATION OF GRADED REFRACTIVE-INDEX SILICON OXYNITRIDE THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY

Authors: CALLARD S GAGNAIRE A JOSEPH J

Citation: S. Callard et al., CHARACTERIZATION OF GRADED REFRACTIVE-INDEX SILICON OXYNITRIDE THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY, Thin solid films, 313, 1998, pp. 384-388

ADAPTED WAVELENGTH METHODS FOR IN-SITU ELLIPSOMETRY

Authors: CALLARD S GAGNAIRE A BESLAND MP JOSEPH J

Citation: S. Callard et al., ADAPTED WAVELENGTH METHODS FOR IN-SITU ELLIPSOMETRY, Thin solid films, 313, 1998, pp. 479-483

FABRICATION AND CHARACTERIZATION OF GRADED REFRACTIVE-INDEX SILICON OXYNITRIDE THIN-FILMS

Authors: CALLARD S GAGNAIRE A JOSEPH J

Citation: S. Callard et al., FABRICATION AND CHARACTERIZATION OF GRADED REFRACTIVE-INDEX SILICON OXYNITRIDE THIN-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(4), 1997, pp. 2088-2094

DEPOSITION OF SIO2 AND TIO2 THIN-FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FOR ANTIREFLECTION COATING

Authors: MARTINET C PAILLARD V GAGNAIRE A JOSEPH J

Citation: C. Martinet et al., DEPOSITION OF SIO2 AND TIO2 THIN-FILMS BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FOR ANTIREFLECTION COATING, Journal of non-crystalline solids, 216, 1997, pp. 77-82

IN-SITU PHOTOLUMINESCENCE CONTROL DURING FABRICATION OF SIO2 INP STRUCTURES/

Authors: LAMBRINOS MF BESLAND MP GAGNAIRE A LOUIS P CALLARD S JOSEPH J

Citation: Mf. Lambrinos et al., IN-SITU PHOTOLUMINESCENCE CONTROL DURING FABRICATION OF SIO2 INP STRUCTURES/, Journal of the Electrochemical Society, 144(6), 1997, pp. 2086-2095

NEW METHOD FOR IN-SITU CONTROL OF BRAGG REFLECTOR FABRICATION

Authors: CALLARD S GAGNAIRE A JOSEPH J

Citation: S. Callard et al., NEW METHOD FOR IN-SITU CONTROL OF BRAGG REFLECTOR FABRICATION, Applied physics letters, 68(17), 1996, pp. 2335-2336

PHYSICOCHEMICAL AND STRUCTURAL STUDY OF V ERY THIN SILICON-NITRIDE AND OXYNITRIDE FORMED BY RAPID THERMAL-TREATMENT

Authors: SAOUDI R HOLLINGER G GAGNAIRE A PITAVAL M MOLLE P

Citation: R. Saoudi et al., PHYSICOCHEMICAL AND STRUCTURAL STUDY OF V ERY THIN SILICON-NITRIDE AND OXYNITRIDE FORMED BY RAPID THERMAL-TREATMENT, Journal de physique. III, 5(5), 1995, pp. 557-573

GROWTH AND STRUCTURE OF RAPID THERMAL SILICON-OXIDES AND NITROXIDES STUDIED BY SPECTROELLIPSOMETRY AND AUGER-ELECTRON SPECTROSCOPY

Authors: GONON N GAGNAIRE A BARBIER D GLACHANT A

Citation: N. Gonon et al., GROWTH AND STRUCTURE OF RAPID THERMAL SILICON-OXIDES AND NITROXIDES STUDIED BY SPECTROELLIPSOMETRY AND AUGER-ELECTRON SPECTROSCOPY, Journal of applied physics, 76(9), 1994, pp. 5242-5248

VERY THIN SILICON DIOXIDE FILM THICKNESS DETERMINATION USING TRANSMISSION ELECTRON-MICROSCOPY, SPECTROSCOPIC ELLIPSOMETRY AND X-RAY PHOTOELECTRON-SPECTROSCOPY

Authors: SAOUDI R HOLLINGER G GAGNAIRE A FERRET P PITAVAL M

Citation: R. Saoudi et al., VERY THIN SILICON DIOXIDE FILM THICKNESS DETERMINATION USING TRANSMISSION ELECTRON-MICROSCOPY, SPECTROSCOPIC ELLIPSOMETRY AND X-RAY PHOTOELECTRON-SPECTROSCOPY, Journal de physique. III, 3(7), 1993, pp. 1479-1488

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