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Authors: OGAWA T GOCHO T NAKANO H TSUKAMOTO M
Citation: T. Ogawa et al., HYDROGENATED SILICON-OXYNITRIDE FILM ANTIREFLECTIVE LAYER FOR OPTICALLITHOGRAPHY, JPN J A P 1, 36(6A), 1997, pp. 3775-3785

Authors: GOCHO T OGAWA T MUROYAMA M SATO J
Citation: T. Gocho et al., CHEMICAL-VAPOR-DEPOSITION OF ANTIREFLECTIVE LAYER FILM FOR EXCIMER-LASER LITHOGRAPHY, JPN J A P 1, 33(1B), 1994, pp. 486-490
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