Authors: TELFORD SG EIZENBERG M CHANG M SINHA AK GOW TR

Citation: Sg. Telford et al., CHEMICALLY VAPOR-DEPOSITED TUNGSTEN SILICIDE FILMS USING DICHLOROSILANE IN A SINGLE-WAFER REACTOR - GROWTH, PROPERTIES, AND THERMAL-STABILITY, Journal of the Electrochemical Society, 140(12), 1993, pp. 3689-3701