Citation: Hk. Park et al., A PRACTICAL EXCIMER LASER-BASED CLEANING TOOL FOR REMOVAL OF SURFACE CONTAMINANTS, IEEE transactions on components, packaging, and manufacturing technology. Part A, 17(4), 1994, pp. 631-643
Authors:
YAVAS O
LEIDERER P
PARK HK
GRIGOROPOULOS CP
POON CC
LEUNG WP
DO N
TAM AC
Citation: O. Yavas et al., OPTICAL AND ACOUSTIC STUDY OF NUCLEATION AND GROWTH OF BUBBLES AT A LIQUID-SOLID INTERFACE INDUCED BY NANOSECOND-PULSED-LASER HEATING, Applied physics. A, Solids and surfaces, 58(4), 1994, pp. 407-415
Citation: Xf. Xu et al., MEASUREMENT OF SOLID-LIQUID INTERFACE TEMPERATURE DURING PULSED EXCIMER-LASER MELTING OF POLYCRYSTALLINE SILICON FILMS, Applied physics letters, 65(14), 1994, pp. 1745-1747
Citation: Xf. Xu et al., TRANSIENT HEATING AND MELTING TRANSFORMATIONS IN ARGON-ION LASER IRRADIATION OF POLYSILICON FILMS, Journal of applied physics, 73(12), 1993, pp. 8088-8096
Citation: Xf. Xu et Cp. Grigoropoulos, HIGH-TEMPERATURE RADIATIVE PROPERTIES OF THIN POLYSILICON FILMS AT THE LAMBDA=0.6328 MU-M WAVELENGTH, International journal of heat and mass transfer, 36(17), 1993, pp. 4163-4172