Citation: Y. Gueorguiev et al., NUMERICAL MODELING OF THE PROCESSES OF EXPOSURE AND DEVELOPMENT IN ELECTRON-BEAM LITHOGRAPHY ON HIGH-TEMPERATURE SUPERCONDUCTOR THIN-FILMS, Mathematics and computers in simulation, 47(2-5), 1998, pp. 299-307
Citation: Y. Gueorguiev et al., NUMERICAL MODELING OF THE PROCESSES OF EXPOSURE AND DEVELOPMENT IN ELECTRON-BEAM LITHOGRAPHY ON HIGH-TEMPERATURE SUPERCONDUCTOR THIN-FILMS, Thin solid films, 323(1-2), 1998, pp. 222-226